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SiOx-Based Multilayer Barrier Coatings Produced by a Single PECVD Process

机译:通过单PECVD工艺生产的SiOx基多层阻隔涂层

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摘要

Multilayer organic/inorganic gas barrier coatings on plastics are needed for high performance demanding applications from OLEDs to packaging. In order to simplify the multilayer deposition process, we developed a single step vacuum process where silicon oxide-based PECVD multilayers are obtained by the modulation of the hexamethyldisiloxane (HMDSO) precursor inlet and interfaces are controlled by pumping speed. In this way, depending on O2/HMDSO ratio, ‘ceramic’ or ‘polymeric’ layers are deposited, with nanometre control of thickness of layers and interfaces. Permeability behaviour of the multilayer structures obtained is described as a function of the number of layers and their thickness.
机译:从OLED到包装的高性能要求苛刻的应用,都需要塑料上的多层有机/无机气体阻隔涂层。为了简化多层沉积工艺,我们开发了单步真空工艺,其中通过调节六甲基二硅氧烷(HMDSO)前驱物入口获得基于氧化硅的PECVD多层,并通过抽速控制界面。这样,根据O2 / HMDSO的比例,可以“纳米”控制层和界面的厚度,沉积“陶瓷”或“聚合物”层。将所获得的多层结构的渗透性行为描述为层数及其厚度的函数。

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